IBM 193nm Semiconductor Resist: Material Properties, Resist Characteristics and Lithographic Performance.

Effects of photoacid generator incorporation into the polymer main chain on 193nm chemically amplified resist behavior and lithographic performance

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Nanoimprint Resist Material Containing Ultraviolet Reactive Fluorine Surfactant for Defect Reduction in Lithographic Fabrication

The generated resist based defects on the template in addition to the presence of particles and contaminants is critical for ultraviolet curing of nanoimprint lithographic fabrication. This procedure is proven to be suitable for advanced resist material design under the process conditions. Nanoimprint resist material containing an ultraviolet reactive fluorine surfactant was developed to modify...

Characteristics of resist films produced by spinning

A model is presented for the description of thin films prepared from solution by spinning. Using only the centrifugal force. linear shear forces. and uniform evaporation of the solvent. the thickness of the film and the time of drying can be calculated as functions of the various processing parameters. The model is compared with experimental results obtained on positive photoresists and excelle...

Astrocytes Resist HIV-1 Fusion but Engulf Infected Macrophage Material

HIV-1 disseminates to diverse tissues and establishes long-lived viral reservoirs. These reservoirs include the CNS, in which macrophage-lineage cells, and as suggested by many studies, astrocytes, may be infected. Here, we have investigated astrocyte infection by HIV-1. We confirm that astrocytes trap and internalize HIV-1 particles for subsequent release but find no evidence that these partic...

Does Life resist desynchronisation?